Toshiba and SanDisk have announced a joint venture that will have the two firms working together in a NAND flash fabrication facility. The facility will be called Fab 5 and located at Yokkaichi Operations in the Mie Prefecture.

The construction of the new fab will be phased with construction set for completion in the spring of 2011. The facility will have about 38,000 square meters of space inside and be five stories.

Each company will have control over what is produced for their own needs. The fab will also be very green with LED lighting and inverter-controlled pumps for equipment. Fab 5 will produce about 12% less CO2 than the similar Fab 4 facility.